Mks Astron 2l Manual -

The ASTRON 2L should be mounted close to the processing chamber (within a few feet) to minimize the recombination of fluorine radicals before they enter the chamber.

Use only facility water that meets the minimum resistivity requirements (often

The ASTRON 2L uses highly reactive gas (NF₃) and generates high-frequency radiation.

), which then reacts with chamber wall deposits to form easily scrubbed gases. mks astron 2l manual

The ASTRON line is considered a standard for high-throughput semiconductor manufacturing

) supplies through mass flow controllers. The unit requires pure

Ensure all seals (like O-rings) are compatible with your process gas. For NF3cap N cap F sub 3 The ASTRON 2L should be mounted close to

process gas line through an isolated mass flow controller (MFC).

The (Model AX7657-85) is a high-performance Remote Plasma Source (RPS) designed for reactive gas generation in semiconductor manufacturing. This specialized equipment is primarily used for NF3 dissociation to clean process chambers. Core Technical Specifications

Connect the to the primary ignition gas port. Route the NF3NF sub 3 The ASTRON line is considered a standard for

Check the cooling water loop; low flow will trip the internal thermal switch. :

Must be shorted or driven by a safety circuit to enable power delivery.